Magnetron Cathodes | Ion Sources | Reactive Process Control
Vacuum Quality Analyzer
Gencoa is a customer-focused company providing expert solutions for the vacuum coating sector throughout the world. For more than twenty years, Gencoa has been perfecting its range of magnetron and plasma deposition components, in addition to the introduction of process control and sensing products. In 2016, the company moved into its new purpose-built production and R&D facility in order to drive it's business expansion and bring new innovations to the market.
Download the NEW Gencoa brochure:
| gencoa-company-brochure-2017.pdf |
OPTIX VACUUM ANALYZER
The OPTIX Vacuum Analyzer is an essential tool for anyone conducting ALD or PVD and looking for a cost effective alternative to a differentially pumped RGA. OPTIX employs its own proprietary plasma generator in conjunction with an optical emission analyzer and software, that enables the user to monitor background gases in both plasma and non-plasma vacuum processes. OPTIX couples to the load lock or process chamber via a KF25 flange and utilizes the process tool's vacuum. It will operate at pressures from 750 mTorr to below 1e-6 Torr. Contact us to arrange a demonstration in Northern California, Nevada, Oregon, Washington or Idaho.
Download the OPTIX data sheet
| optix_flyer[1].pdf |
3G Circular Magnetron Sputter Sources
Gencoa designed and manufactures the 3G (Third Generation) Circular Cathodes for applications that require a cost-effective / yet technically innovative solution in small diameter sputter sources. The family of 3G Circular Magnetrons are available in 2, 3, 4 and 5 inch target diameters and feature:
- Smallest Footprint
- +/- 45 degree tilt angle adjustment (1 degree accuracy)
- Internal gas injection as a standard feature
- Rear utility box for RF and HIPIMS applications
- Target thickness from 1 to 6 mm
- Simple target change
- High strength magnetics for sputtering of magnetic materials
- Pre-configured for direct or indirect cooling
- Numerous options available
Download the informative 3G product presentation and 3G data sheet
| gencoa-3g-circular-presentation.pdf |
FULL FACE EROSION CIRCULAR SOURCE Gencoa has expanded the circular full face erosion (FFE) magnetron range down to 3-inch target size. Gencoa's full face erosion (FFE) magnetics are unique and powerful tools for the high-rate deposition of sputtered layers with high target use. Gencoa's range of FFE magnetrons are capable of overcoming many of the traditional difficulties experienced when performing high-rate reactive deposition like nodule growth rates, but increasing the total target surface sputtering area. 
PLANAR MAGNETRON SOURCES
Gencoa manufacture the widest range of rectangular magnetrons available on the market for both internal and external mounting. There is an unrivalled range of magnetic options created to offer the optimum solution for your processing needs. Careful attention is given to all aspects of the simulation, design and manufacture process. Parametric 3D CAD design enables the efficient production of both standard designs and highly customized products tuned to your requirements. 
REPLACEMENT MAGNETICS In some cases where it is not necessary or desirable to replace a complete magnetron cathode, it is possible for Gencoa to provide a replacement magnetic system to fit into the existing cathode body. This is a cost-effective method of upgrading the performance of the current system. In nearly all cases it is possible to fit our standard balanced (SW) or unbalanced (PP) magnetic systems. In 70% of cases it is possible to fit our high yield (HY) type magnetics. Possible reasons to replace magnets are as follows:
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GENCOA IMC75 CIRCULAR ION SOURCE Gencoa's new IMC75 is a gridless and self-neutralizing circular ion source, and marks a new generation in ion etching. The IMC75 boasts a long maintainance cycle - both in reactive and inert environments - and has an operational range of up to 90mA and up to 3kV. There is no contamination, which makes the product suitable for semi conductor applications. Other applications include substrate pre-clean, ion assist, etch/texturing and PACVD deposition. The IMC75 is easy to fit, with a 1" shaft mount and outer diameter of 5", and is an ideal pair for Gencoa's new 3" and 4" circular full face erosion magnetrons. 
Gencoa have developed a new type of small tube magnetron – the Gencoa Rotatable System (GRS). GRS is different to all other designs on the market (patent pending) and allows easy retro-fitting into Gencoa standard planar magnetron sized flanges.
The GRS75 has been developed primarily to allow conversion of existing planar magnetron sputter systems to use rotatable technology. This is achieved by the narrow end-block ensuring the target length and uniformity matches the existing planar target length. 
EFFUSION CELL The pulsed cracker effusion cell is a collaborative development between Nano4Energy and Gencoa, and is an innovative solution for single-stack sputtering, incorporating selenization/sulphurization. The inclusion of a pulsed effusion cell to the process enables materials such as Selenium and Sulphur to be introduced during the sputtering of metals, allowing the controlled injection and dispersion of Se and S in application fields such as PV solar cells (CIGS processes). By using the effusion cell in conjunction with Speedflo, a high degree of feedback control can be achieved through input from a sensor within the process. Areas of application include CIGS, monomer vapors for barrier layer and organic vapors for OLED. |
Linear ion sources by Gencoa are a robust and flexible means of pre-cleaning polymer and glass substrates prior to thin film deposition. The plasma jets generated impact the substrate to burn-off hydrocarbons and activate the surface to promote adhesion of the deposited film. The intense plasma jets are generated by a combination of the magnetic and electrical field across a narrow gap through which the gas or gases pass. DC power modes can be applied with typical voltages in the 1.5-3kV range to provide a 'high' impact plasma pre-treatment. The use of pure argon gas generates the most effective plasma cleaning, but any combination of gases can be used. The plasma can also be used for deposition and polymerization via the gas phase. Gencoa ion sources have the unique feature of graphite anode and cathode protection to reduce the erosion of source to low levels. Graphite based hardware is standard in other types of plasma sources, but only Gencoa have it for the linear ion sources. The robust and easy to service design is available in any length and a variety of internal, external or cantilever mounts.The IM series are not recommended for metallic substrates or very high speed web movements as the discharge currents do not exceed 1A per m length. Gencoa provide a range of different magnetron based solutions for high power magnetically enhanced plasma generation electrodes. 
SPEEDFLO speedflo™ is a multi-channel closed-loop control system for high speed adjustment of a reactive gas during magnetron sputter processes. Its advanced digital control system automatically regulates gas flow to meet sputtering requirements. speedflo's advanced variable structure control algorithm offers significant performance improvements over conventional PID control techniques, both in terms of speed and robustness. Why reactive gas control?Feedback control of reactive gas enables improved deposition rates, coating properties and process reliability, which are not possible to achieve with constant flow. Download the Speedflo brochure:
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Contact us to discuss the specifics of your application or to schedule a product demonstration.